Graphite Purification Equipment

Graphite purification involves introducing halogen gases (chlorine or halogenated hydrocarbons) into graphite material at ultra-high temperatures to react with it. This process converts metallic and non-metallic impurities within the graphite into gaseous or condensed chlorides and complexes with lower melting and boiling points, ultimately separating them from other components and allowing their escape. After purification, graphite achieves a purity exceeding 99.999%, meeting semiconductor industry requirements. It is widely used in semiconductor manufacturing processes such as crystal growth, epitaxy, ion implantation, and plasma etching. To meet the demand for high-purity graphite in domestic semiconductor, photovoltaic monocrystalline, and new energy sectors, our product range covers common temperature zones, dimensions, and gas inlet configurations. Multiple combinations can satisfy the diverse needs of customers across different fields.