CVI330 化学气相沉积炉
化学气相渗透注入工艺(CVI)是化学气相沉积(CVD)法的一种延伸，是指将一种或几种烃类气体化合物经高温分解、缩聚之后炭沉积在多孔介质内部，使材料致密化的方法，是新发展起来的制备无机材料新技术，该技术主要用于制备各种高温陶瓷基复合材料，包括碳/碳复合材料和以碳化物、氮化物为基质的材料，CVI设备主要应用于光伏辅材的碳纤维气体沉积。
0.000 (CNY)
Chemical vapor deposition (CVD) equipment
Chemical vapor deposition (CVD) equipment is thermal processing apparatus that utilizes the chemical vapor deposition process to generate high-purity, dense, and high-performance coating films on substrate surfaces. CVD technology offers advantages such as high deposition rates, easy film formation control, excellent uniformity and repeatability, superior step coverage, broad applicability, and simple equipment. It has been widely adopted in industrial fields for preparing various thin film coatings including SiC, TaC, HfC, and PyC. Leveraging its deep expertise in CVD process control, vacuum thermal engineering, and gas-flow-temperature coupled-field simulation, Northern HuaChuang is dedicated to developing diverse CVD equipment for semiconductor new materials, new energy photovoltaics, and other fields. The advanced PyC, SiC, BN, and Re coating equipment developed by Northern HuaChuang has earned high recognition from leading domestic industry clients due to its outstanding technical performance and process productivity advantages, becoming the preferred equipment for industry clients expanding their production capacity.
Translated with DeepL.com (free version)