Chemical Vapor Deposition (CVD) Equipment

Chemical Vapor Deposition (CVD) technology is a primary technique for preparing high-purity and high-performance solid thin films. A typical CVD process involves introducing one or more vapor-source atoms or molecules into a chamber, where chemical reactions occur under the action of external energy, and the desired thin film is deposited on the substrate surface. Owing to its advantages of a wide film-forming range and excellent reproducibility, CVD technology is widely used for film deposition in various forms.