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WAFER PROFILER CVP21

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    WAFER PROFILER CVP21

    The Wafer Profiler CVP21 is a handy tool  to measure doping profiles in semiconductor layers by Electrochemical Capacitance Voltage Profiling (ECV-Profiling, CV-Profiling) in semiconductor research or production.
    This ECV Profiler (CV-Profiler, C-V-Profiler) furthermore is a very good choice to analyze or develop strategies for Photo-Electrochemical Wet Etching (PEC-Etching) of semiconductors.



    CVP21 is the COMPLETE SOLUTION:

    CVP21 supports the COMPLETE spectrum of materials:

    • Group IV semiconductors as Silicon (Si), Germanium (Ge), Silicon Carbide (SiC), or

    • III-V semiconductors as Gallium Arsenide (GaAs), Indium Phosphide (InP), Gallium Phosphide (GaP), ..., or

    • ternary III-V alloys as Aluminum Gallium Arsenide (AlGaAs), Gallium Indium Phosphide (GaInP), Aluminium Indium Arsenide (AlInAs) ..., or

    • quaternary III-V alloys as Aluminum Gallium Indium Phosphide (AlGaInP), ..., or

    • Nitrides, as Gallium Nitride (GaN), Aluminum Gallium Nitride (AlGaN), Indium Gallium Nitride (InGaN) or Aluminum Indium Nitride (AlInN), or

    • II-VI semiconductors as Zinc Oxide (ZnO), Cadmium Telluride (CdTe), Mercury Cadmium Telluride (HgCdTe, MCT)..., or

    • less commonly used semiconductors (please contact us for sample measurements).

    CVP21 supports the COMPLETE sample range:

    • Stacked layers are no problem (the material, the doping and the doping type may vary).

    • No Restrictions concerning the substrate (may be conductive or insulating).

    • Sample size: 4*2 mm² to complete 8" wafer size are standard (smaller samples on request).

    CVP21 supports the COMPLETE resolution range:

    • Concentration resolution < 1012 cm-3 to > 1021 cm-3 (*).

    • Depth resolution 1 nm to 100 µm (*).

    (*) may depend on material type/ sample quality. Please ask for sample measurements

     

    CVP21 comes as a  COMPLETE measurement system:

    • High Reliability system (special concern on electronics, mechanics, optics and fluid system).

    • Calibration-free system (Complete self calibrating electronic system - no needs for cable capacitance calibration).

    • Easy-to-use (Software optimized with full user management - easily used as well in production as in laboratory environment).

    • Wafer-Stepping (Complete wafer stepper is optionally available - to process several measurements on a wafer in full automation).

    • Camera-Control (The process is controlled on-line by a color camera - after each measurement camera data is available in film strip format).

    • Recipes (Measurement recipes are pre-defined and may easily modified by a user with higher priority).

    • Dry-In / Dry-Out: Auto-Load / Unload / Reload (The loading/ un-loading and re-loading of the electrochemical cell is automated and may be easily modified by a user with higher priority. The samples are processed dry-in / dry-out).